Fabrication of ion-trap electrodes by self-terminated electrochemical etching
Key Lab of Quantum Information, CAS, University of Science and Technology of China, Hefei, Anhui, 230026, China
2 Department of Physics, Indiana University Purdue University Indianapolis, Indianapolis, IN, 46202, USA
3 Synergetic Innovation Center of Quantum Information & Quantum Physics, University of Science and Technology of China, Hefei, Anhui, 230026, China
4 Carmel High School, Carmel, IN, 46032, USA
* e-mail: email@example.com
Accepted: 3 March 2016
Published online: 17 March 2016
Self-terminated electrochemical etching is applied to fabricate needle electrodes for ion traps. We study the surface morphology of the electrodes with scanning electron microscopy and atomic force microscopy, and find that the surface curvature and roughness can be reduced by optimizing the etching parameters. Our method provides a convenient and low-cost solution to improve the surface quality of electrodes for ion traps.
Key words: Ion trap / Electrochemical etching / Surface roughness
© Wang et al.; licensee Springer., 2016
licensee Springer on behalf of EPJ. This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.